GEMStar XT-P Thermal and PEALD 

Equipped with a 300 Watt air cooled direct Inductively Coupled Plasma (ICP) RF system with four metal sealed user selectable Mass Flow Controlled gas inputs, the GEMStar XT-DP system is a powerful plasma enhanced system to extend your research and processing requirements to the next level using Plasma Enhanced ALD.

Options :

• Loadlock : 
  • Prevents deposition chamber from contaminants such as oxygen, moisture, and organics. Some ALD metal processes are sensitive to contaminants.
• Glovebox Interface : 
  • Access to precursors and maintenance:  Side mounted GEMStar allows simple access by removing the clamshell cover.
  • Space in the glove box:  GEMStar has an access port for the swing out door built into the side of the box. No space is taken up in the middle of the glove box by a large chamber.
  • Ease of Loading/Unloading:  GEMStar is accessed horizontally, not vertically.  Foreign objects and particle introduction are minimized.
  • Heat management:  Vertical chambers generate significant heat which has to be managed in the glove box using active cooling components.  GEMStar does have a heated door but most of the chamber heat is outside of the glove box and no active cooling is necessary.
• Hot Platen (500°C) :
  • The GEMStar XT HP Heated Platen Option is designed to offer GEMStar XT Benchtop ALD Systems the ability to achieve higher processing temperature than standard. Although not required for most ALD or PEALD processing, this option will allow single substrate processing up to 500 °C while maintaining reactor near manifold temperature.